Plasma Research in the School of EECS


 

Organic Composite Coating on 316L Stainless Steel Coupons

    Faculty in the School of Electrical Engineering and Computer Science and the School of Chemical Engineering and Bioengineering collaborate on plasma-assisted materials processing research.  The plasma laboratory is located at Room 310 in the Engineering Teaching and Research Laboratory (ETRL) on the Pullman campus of Washington State University. Students who have conducted research in this plasma laboratory are now employed throughout the microelectronics fabrication industry. Research has focused on 1) transport modeling in pulsed plasma reactors, 2) fabricating and evaluating plasma-polymerized thin films, 3) using plasma-polymerized composites to fabricate supported catalysts for hydrogen fuel reformers, and 4) using plasma processing to control the surface energy and wettability of solid surfaces that include polished stainless steel.

Bibliography

  1. I. Al-Hamarneh, P. Pedrow, S. Goheen, and M. Hartenstine, "Impedance Spectroscopy Study of Composite Thin Films of Hydrated Polyethylene Glycol," IEEE Transactions on Plasma Science, Vol. 35, No. 5, pp. 1518-1526, October 2007.

  2. R. Dhar, P. D. Pedrow, K. C. Liddell, Q. Ming, T. M. Moeller and M. A. Osman, "Synthesis of Pt/ZrO2 Catalyst on Fecralloy Substrates Using Composite Plasma–polymerized Films," IEEE Transactions on Plasma Science, Vol. 33, No. 6, pp. 2035-2045, December 2005.

  3. R. Dhar, P. D. Pedrow, K. C. Liddell, Q. Ming, T. M. Moeller and M. A. Osman, "Plasma Enhanced Metal Organic Chemical Vapor Deposition (PEMOCVD) of Catalytic Coatings for Fuel Cell Reformers," IEEE Transactions on Plasma Science, Vol. 33, No. 1, pp. 138-146, February 2005.

  4. P. A. Tamirisa, K. C. Liddell, P. D. Pedrow and M. A. Osman, "Pulsed Plasma Polymerized Aniline Thin Films,” Journal of Applied Polymer Science, Vol.93, pp. 1317 –1325, 2004.

  5. L. V. Shepsis, P. D. Pedrow, R. Mahalingam, and M. A. Osman, “Modeling And Experimental Comparison Of Pulsed Plasma Deposition Of Aniline,” Thin Solid Films, Vol. 385, pp. 11-21, 2001.

  6. K. O. Goyal, R. Mahalingam, P. D. Pedrow, and M. Osman, “Mass Transport Characteristics in a Pulsed Plasma Enhanced Chemical Vapor Deposition Reactor for Thin Polymer Film Deposition,” IEEE Transactions on Plasma Science, Vol. 29, No. 1, pp. 42-50, February 2001.

  7. L. V. Shepsis, P. D. Pedrow, R. Mahalingam, and M. Osman, “Modeling and Measurement of Monomer Pressure Evolution in an Inductively Coupled Pulsed Plasma Reactor for Thin Polymer Films,” IEEE Transactions on Plasma Science, Vol. 28, No. 6, pp. 2172-2178, December 2000.

  8. P. D. Pedrow, K. O. Goyal, R. Mahalingam, and M. A. Osman, “Explosion Model Applied to an Intense Pulsed Plasma Source for Thin Film Deposition,” IEEE Transactions on Plasma Science, Vol. 25, No. 1, pp. 89-96, February 1997.

  9. P. D. Pedrow, A. M. Nasiruddin, and R. Mahalingam, "Deposition of plasma-polymerized acetylene by an intense pulsed RF plasma source," IEEE Transactions on Plasma Science, Vol. 18, No. 6, pp. 945-947, December 1990.

  10. P. D. Pedrow, A. M. Nasiruddin, and R. Mahalingam, "Unsteady adiabatic isentropic expansion of gas into vacuum from a toroidal puff valve," Journal of Applied Physics, Vol. 67, No. 10, pp. 6109-6113, May 1990.

  11. P. D. Pedrow and A. M. Nasiruddin, "Experimental study of CF4 conical theta pinch plasma expanding into vacuum," IEEE Transactions on Plasma Science, Vol. 17, No. 1, pp. 17-23, February 1989.

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Updated:  October 23, 2007                       Questions or Comments: pedrow@eecs.wsu.edu